The MetHPM project will deliver novel metrology for highly-parallel manufacturing, to enable European manufacturers to quality-control tomorrow’s everyday devices.

MetHPM runs until May 2018 and include these objectives:

  • Faster, more accurate surface structure measurement, for critical dimensions of tracks and channels and for production-speed quality control of micro-/nanostructures
  • 1 µm substrate tracking for 10 µm overlay alignment
  • Process optimisation, inline feedback exploiting defect-function correlation
  • Traceability, standards and metrology guidance using your test cases

Explore the following to learn more about the EMPIR collaborative project MetHPM: