Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent
Seguini, F. Zanenga, T.J. Giammaria, M. Ceresoli, K. Sparnacci, D. Antonioli, V. Gianotti, M. Laus, M. Perego
ACS Applied Materials and interfaces
ACS Appl. Mater. Interfaces 8, 8280–8288 (2016)

Nanoporous Silicon Fabrication by PS-b-PMMA Block- Copolymer Based Lithography
Stefano Danesi
Masters thesis

Electronic Characterization of holey semiconductors fabricated by block-copolymer lithography
Davide Martella
Masters thesis

Understanding the physico-chemical aspects in the depth profiling of polymer:fullerene layers
Surana; T. Conard; C. Fleischmann; J. G. Tait; J. P. Bastos; E. Voroshazi; R. Havelund; M. Turbiez; Pierre Louette; Alexandre Felten; C. Poleunis; A.Delcorte; W. Vandervorst
Journal of Physical Chemistry
Phys. Chem. C, 2016, 120 (49), pp 28074–28082
DOI: 10.1021/acs.jpcc.6b09911

Mariavitalia Tiddia, Guido Mula, Elisa Sechi, Annalisa Vacca, Eleonora Cara, Natascia De Leo, Matteo Fretto, Luca Boarino
Nanoscale Research Letters
Nanoscale Research Letters201611:436
DOI: 10.1186/s11671-016-1654-8

High temperature surface neutralization process with random copolymers for block copolymer self-assembly
Katia Sparnacci,Diego Antonioli, Michele Perego,Tommaso Jacopo Giammaria,Gabriele Seguini,Federico Ferrarese Lupi,Giampaolo Zuccheri, Valentina Gianotti, Michele Laus
Polymer International
DOI: 10.1002/pi.5285

SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles
P. Seah, R. Havelund, I. S. Gilmore
Journal of Physical Chemistry C